Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 27(5); 1994
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1994;27(5):253-260. Published online: Nov, 30, -0001

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Analysis of the microstructure of reactively sputtered Ta-N thin films

  • 민경훈;김기범;
    서울대학교 금속공학과;서울대학교 금속공학과;
Abstract

Ta-N films were reactively sputter deposited by dc magnetron sputtering from a Ta target with a various Ar-N, gas ratio. Electrical resistivity of pure Ta film was 150$mu$$Omega$cm and decreased initially with nitrogen addition, and

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