Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 28(3); 1995
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1995;28(3):133-141. Published online: Nov, 30, -0001

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The deposition characteristics of the diamond films deposited on Si, Inconel 600 and steel by microwave plasma CVD method

  • 김현호;김흥회;이원종;
    한국과학기술원 재료공학과;한국원자력연구소 표면개질기술개발그룹;한국과학기술원 재료공학과;
Abstract

The deposition characteristics of diamond films were investigated for three different substrates : Si, Inconel 600 and steel. Diamond films were prepared by microwave plasma CVD method using $CH_4$, $H_2$ and $O_2$ as reac

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