Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 28(4); 1995
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1995;28(4):225-235. Published online: Nov, 30, -0001

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Effects of Pretreatment Condition and Substrate Bias on the Characteristics of MPECVD Diamond Thin Films

  • 최지환;박정일;박광자;이은아;장감용;박종완;
    한양대학교 금속공학과;국립공업기술원 무기화학과;국립공업기술원 무기화학과;쌍용 양회 중앙연구소;쌍용 양회 중앙연구소;한양대학교 금속공학과;
Abstract

To investigate the effects of pretreatment and substrate bias on the characteristics of the diamond thin films, the thin films were deposited on the p-type Si(100) wafer by MPECVD using mixtures of $H_2$, $CH_4$, and $O_2$

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