Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 28(6); 1995
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1995;28(6):386-392. Published online: Nov, 30, -0001

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Crystallographic Characteristics of ZnO Films Deposited on SiO$_2$/Si Substrate

  • Park, H.D.;Kim, K.S.;Lee, C.S.;Kim, J.W.;Han, B.M.;Kim, S.Y.;
    Department of physics, National Fisheries University of Pusan;Department of physics, National Fisheries University of Pusan;Department of physics, National Fisheries University of Pusan;Department of physics, Korea Advanced Institute of Science and Techno
Abstract

The RF planar magnetron sputtering technique was used to fabricate uniform ZnO/$SiO_2$/Si thin films at high growth rate. A detailed crystallographic character of these thin films has been carried oct using XRD, XRC, and SEM. These thin films h

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