Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 29(5); 1996
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1996;29(5):338-344. Published online: Nov, 30, -0001

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COMPARISON OF PLASMA-INDUCED SURFACE DAMAGES IN VARIOUS PLASMA SOURCES

  • Yi, Dong-Hyen;Lee, Jun-Sik;Kim, Sang-Kyun;Kim, Jae-Jeong;
    Advanced Technology R&D Laboratories, LG Semicon Co. Ltd.;Advanced Technology R&D Laboratories, LG Semicon Co. Ltd.;Advanced Technology R&D Laboratories, LG Semicon Co. Ltd.;Advanced Technology R&D Laboratories, LG Semicon Co. Ltd.;
Abstract

This study was an investigation of plasma-induced damages on silicon substrate in the semiconductor manufacturing technology. The plasma-induced damage level on silicon substrate was analyzed and compared in various plasma etching systems. The analysis me

Keywords