Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 29(5); 1996
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1996;29(5):350-356. Published online: Nov, 30, -0001

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VHF-PECVD OF Ti/TiN WITH SILANE REDUCTION PROCESS

  • Mizuno, Shigeru;
    ANELVA Corpotation, Yotsuya;
Abstract

This paper presents VHF-Plasma Enhanced Chemical Vapor Deposition (VHF-PECVD) of Ti/TiN with silne reduction process, using $TiCl_4$ source. VHF plasma, which is denser than a conventional RF plasma, produces a large number of radicals. Sila

Keywords