Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 29(5); 1996
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1996;29(5):505-511. Published online: Nov, 30, -0001

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FIELD EMISSION CHARACTERISTICS OF DIAMOND FILMS

  • Park, Kyung-Ho;Lee, Soon-Il;Koh, Ken-Ha;Park, Jung-Il;Park, Kwang-Ja;
    Department of Physics, Ajou University;Department of Physics, Ajou University;Department of Physics, Ajou University;Inorganic Chemistry Department, National Institute of Technology and Quality;Inorganic Chemistry Department, National Institute of Technol
Abstract

The field emission characteristics of diamond films deposited by microwave plasma enhanced chemical vapor deposition (MPECVD) method were investigated. Diamond films were deposited on n-type Si(100) wafer using various mixtures of hydrogen and methane gas

Keywords