Oct, 31, 2024

Vol.57 No.5

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  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 29(5); 1996
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1996;29(5):577-584. Published online: Nov, 30, -0001

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EFFECTS OF SUBSTRATE TEMPERATURE ON PROPERTIES OF FLUORINE CONTAINED SILICON OXIDE FILMS PREPARED BY MICROWAVE PLASMA- ENHANCED CVD

  • Sugimoto, Nobuhisa;Hozumi, Atsushi;Takai, Osamu;
    Department of Materials Processing Engineering Nagoya University;Department of Materials Processing Engineering Nagoya University;Department of Materials Processing Engineering Nagoya University;
Abstract

Silicon oxide films with high hardness and water repellency were prepared by microwave plasma-enhanced CVD using four kind of organosilicon compound-fluoro-alkyl silane mixtures as source gases. An argon gas was used as a carrier gas for fluoro-alkyl sila

Keywords