Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 29(6); 1996
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1996;29(6):648-653. Published online: Nov, 30, -0001

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OPTICAL EMISSION SPECTROSCOPY OF Ch$_4$/Ar/H$_2$ GAS DISCHARGES IN RF PLASMA CVD OF HYDROGENATED AMORPHOUS CARBON FILMS

  • Lee, Sung-Soo;Osamu Takai;
    Department of Materials Processing Engineering, School of Engineering, Nagoya University;;
Abstract

Hydrogenated amorphous carbon(a-C:H) films are prepared by rf plasma CVD in a $CH_4$ source gas system diluted with Ar of $H_2$. The spectra of emissive and reactive species in the plasma are detected using in stiu optical emission s

Keywords