Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 30(2); 1997
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1997;30(2):121-127. Published online: Nov, 30, -0001

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Electrochemical Behavior of Vanadium Trungsten Oxide Thin Films Deposited by Sputtering

  • 박영신;이병일;주승기;
    서울대학교 재료공학부;서울대학교 재료공학부;서울대학교 재료공학부;
Abstract

Vanadium tungsten oxide thin films were formed by RF magnetron sputtering and the effects of tungsten addition on the crystallinity and on the electrochemical behavior were investigated. X-ray analysis revealed that amorphized films could be obtained by t

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