Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 31(3); 1998
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1998;31(3):165-170. Published online: Nov, 30, -0001

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Fabrication of Diamoud Thin Films using RF Plasma

  • 신재균;현준원;
    응용물리학과;단국대학교 서울시 용산구 한남동 산8, 140-714;
Abstract

Deposition of diamond on silicon substrates has been performed by RF HPCVD (Helicon Plasma Chemical Vapor Deposition) from methane-hydrogen gas mixture. Growth properties and deposition condition conditions have been studies as functions of substrate temp

Keywords