Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 31(3); 1998
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1998;31(3):171-176. Published online: Nov, 30, -0001

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Effects of Oxygen Partial Pressure on ITO Thin Films PrePared by Reactive dc Magenetron Sputtering

  • 신성호;신재혁;박광자;김현우;
    무기화학과, 국립기술품질원 , 경기도 과천시 427-010;무기화학과, 국립기술품질원 , 경기도 과천시 427-010;무기화학과, 국립기술품질원 , 경기도 과천시 427-010;전자과, 두원공과대학 경기도 안성시 456-890;
Abstract

Transparent conducting ITO (Indium Tin Oxide) thin films were prepared on soda lime glass by reactive dc magnetron sputtering mothod. The maaterial properties were measured by the X-ray diffraction meter (XRD) and atomic force microscopy (AFM) scanning. A

Keywords