Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 32(2); 1999
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1999;32(2):165-171. Published online: Nov, 30, -0001

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Surface Reaction of Uranium Dioxide with CF$_4$/O$_2$ Mixture Gas Plasma

  • 민진영;김용수;
    한양대학교 원자력공학과;한양대학교 원자력공학과;
Abstract

The etching reaction of $UO_2$ in $CF_4/O_2$ gas plasma is examined as functions of $CF_4/O_2$ ratio, plasma power, and substrate temperature at up to $370^{circ}C$ under the total pressure of 0.30 Torr. It is f

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