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Review
- KISE Journal of Korean Institute of Surface Engineering
- Volume 32(3); 1999
- Article
Review
KISE Journal of Korean Institute of Surface Engineering 1999;32(3):244-248. Published online: Nov, 30, -0001
PHOTOELECTRODEPOSITION OF COPPER ON BORON-DOPED DIAMOND FILMS: ITS APPLICATION TO CONDUCTIVE PATTERN FORMING ON DIAMOND AND DIAMOND PHOTOGRAPHIC PHENOMENON
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Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University;Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University;Department of Energy and Environmental Science, Gra
Abstract
Photoelectrodeposition of copper on semiconductive B-doped diamond films was investigated. There are cleasr morphology differences between photodeposited copper and electrodeposited copper. Photoelecrodeposition proceeded as uniform 2-dimensional growth.
Keywords B-depoed diamond;copper;elecrodeposition;photoelectrodeposition;