Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 32(4); 1999
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 1999;32(4):538-546. Published online: Nov, 30, -0001

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Photoelectrochemical Property of Ti(IV)-Fe(III) Oxide Films Deposited by MOCVD

  • 김현수;윤재홍;
    동북공업기술연구소 환경재료연구실;창원대학교 공과대학 금속재료공학과;
Abstract

Ti(IV)-Fe(III) oxide films were formed by MOCVD technique, and their photoelectrochemical properties were examined in 0.5M N $a_2$$SO_4$ solution by a photoelectrochemical polarization test. Ti(IV)-Fe(III) oxide films deposited at 40

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