Oct, 31, 2024

Vol.57 No.5

Editorial Office

Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 36(1); 2003
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2003;36(1):27-33. Published online: Nov, 30, -0001

PDF

Pulsed Magnetron Sputtering Deposit ion of DLC Films Part I : Low-Voltage Bias-Assisted Deposition

  • Oskomov, Konstantin V.;Chun, Hui-Gon;You, Yong-Zoo;Lee, Jing-Hyuk;Kim, Kwang-Bok;Cho, Tong-Yul;Sochogov, Nikolay S.;Zakharov, Alexender N.;
    Inst. of High Current Electronics, Siberian Div. of RAS;School of Materials Science and Engineering, ReMM, University of Ulsan;School of Materials Science and Engineering, ReMM, University of Ulsan;School of Materials Science and Engineering, ReMM, Univer
Abstract

Pulsed magnetron sputtering of graphite target was employed for deposition of diamond-like carbon (DLC) films. Time-resolved probe measurements of magnetron discharge plasma have been performed. It was shown that the pulsed magnetron discharge plasma dens

Keywords Diamond-like carbon;Graphite;Pulsed magnetron sputtering;Low-voltage bias;