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KISE Journal of Korean Institute of Surface Engineering 2003;36(2):122-127. Published online: Nov, 30, -0001
Ti - Si - N hard films were deposited on SKD11 steel substrates by a hybrid deposition system, where TiN was deposited by AIP method while Si was incorporated by sputtering one. The microstructure of Ti-Si-N films was revealed to be a composite of TiN cry
Keywords Ti-Si-N;Hybrid deposition system;Superhardness;