Oct, 31, 2024

Vol.57 No.5

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Review

  • KISE Journal of Korean Institute of Surface Engineering
  • Volume 36(2); 2003
  • Article

Review

KISE Journal of Korean Institute of Surface Engineering 2003;36(2):148-154. Published online: Nov, 30, -0001

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Pulsed Magnet ron Sputtering Deposit ion of DLC Films Part II : High-voltage Bias-assisted Deposition

  • Chun, Hui-Gon;Lee, Jing-Hyuk;You, Yong-Zoo;Ko, Yong-Duek;Cho, Tong-Yul;Nikolay S. Sochugov;
    School of Materials Science and Engineering, Remm, University of Ulsan;School of Materials Science and Engineering, Remm, University of Ulsan;School of Materials Science and Engineering, Remm, University of Ulsan;School of Materials Science and Engineerin
Abstract

Short ($ au$=40 $mutextrm{s}$) and high-voltage ($U_{sub}$=2~8 kV) negative substrate bias pulses were used to assist pulsed magnetron sputtering DLC films deposition. Space- and time-resolved probe measurements of the pla

Keywords Diamond-fike carbon;Graphite;Pulsed magnetron sputtering;High-voltage bias;